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 Title: |
US5998298:
Use of chemical-mechanical polishing for fabricating photonic bandgap structures
[ Derwent Title ]
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| Country: |
US United States of America
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| Inventor: |
Fleming, James G.; Albuquerque, NM
Lin, Shawn-Yu; Albuquerque, NM
Hetherington, Dale L.; Albuquerque, NM
Smith, Bradley K.; Edgewood, NM
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| Assignee: |
Sandia Corporation, Albuquerque, NM
other patents from SANDIA CORPORATION (491520) (approx. 612)
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| Published / Filed: |
1999-12-07
/ 1998-04-28
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| Application Number: |
US1998000067614
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| IPC Code: |
Advanced:
G02B 6/122;
G02B 6/132;
G02B 6/12;
Core:
more...
IPC-7:
H01L 33/00;
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| ECLA Code: |
G02B6/122P; G02B6/132;
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| U.S. Class: |
Current:
438/692;
257/017;
359/344;
438/690;
438/691;
438/800;
Original:
438/692;
438/690;
438/691;
438/800;
257/017;
359/344;
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| Field of Search: |
438/690,691,692,693,800,959,962
257/017
359/344
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| Government Interest: |
GOVERNMENT RIGHTS
This invention was made with Government support under Contract No. DE-AC04-94AL85000 awarded by the U.S. Department of Energy. The Government has certain rights in the invention.
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| Priority Number: |
| 1998-04-28 |
US1998000067614 |
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| Abstract: |
A method is disclosed for fabricating a two- or three-dimensional photonic bandgap structure (also termed a photonic crystal, photonic lattice, or photonic dielectric structure). The method uses microelectronic integrated circuit (IC) processes to fabricate the photonic bandgap structure directly upon a silicon substrate. One or more layers of arrayed elements used to form the structure are deposited and patterned, with chemical-mechanical polishing being used to planarize each layer for uniformity and a precise vertical tolerancing of the layer. The use of chemical-mechanical planarization allows the photonic bandgap structure to be formed over a large area with a layer uniformity of about two-percent. Air-gap photonic bandgap structures can also be formed by removing a spacer material separating the arrayed elements by selective etching. The method is useful for fabricating photonic bandgap structures including Fabry-Perot resonators and optical filters for use at wavelengths in the range of about 0.2-20 mu m.
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| Attorney, Agent or Firm: |
Hohimer, John P. ;
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| Primary / Asst. Examiners: |
Bowers, Charles; Christianson, K
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| INPADOC Legal Status: |
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| Family: |
None
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First Claim:
Show all 47 claims |
What is claimed is:
1. A method for fabricating a photonic bandgap structure, comprising steps for:
- (a) forming a first layer of spaced elements of the photonic bandgap structure; and
- (b) planarizing the first layer of spaced elements by chemical-mechanical polishing.
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| Background / Summary: |
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| Drawing Descriptions: |
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| Description: |
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| Forward References: |
Show 62 U.S. patent(s) that reference this one
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