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 Title: |
US4683524:
Illumination apparatus
[ Derwent Title ]
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| Country: |
US United States of America
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| Inventor: |
Ohta, Masakatsu; Tokyo, Japan
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| Assignee: |
Canon Kabushiki Kaisha, Tokyo, Japan
other patents from CANON KABUSHIKI KAISHA (87490) (approx. 28,066)
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| Published / Filed: |
1987-07-28
/ 1986-10-16
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| Application Number: |
US1986000919377
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| IPC Code: |
Advanced:
G02B 19/00;
G03B 27/16;
G03B 27/54;
G03F 7/20;
H01L 21/027;
IPC-7:
F21V 7/04;
G03B 27/02;
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| ECLA Code: |
G03F7/70D;
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| U.S. Class: |
Current:
362/268;
355/078;
362/559;
385/116;
Original:
362/268;
362/032;
350/096.24;
350/096.25;
355/078;
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| Field of Search: |
362/268,32
350/96.24,96.25
355/067,70,71,78,132,133
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| Priority Number: |
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| Abstract: |
An illumination apparatus for illuminating a surface, having formed thereon a pattern, to transfer the pattern onto a semiconductor wafer. The apparatus includes an elliptic mirror for forming an image of a light source, an imaging system for re-imaging the image of the light source, formed by the elliptical mirror, while causing a curvature of field, a multi-beam generating system disposed relative to the imaging system so that the optimum focus located at the off-axis position of the imaging system is coincident with an input surface of the multi-beam generating system, and a collimator for directing to the pattern surface a number of discrete light beams generated by the multi-beam generating system to illuminate the pattern surface. Whereby a uniform intensity distribution of the light illuminating the pattern surface and a high light-collecting efficiency are assured.
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| Attorney, Agent or Firm: |
Fitzpatrick, Cella, Harper & Scinto ;
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| Primary / Asst. Examiners: |
Nelli, Raymond A.;
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| Maintenance Status: |
CC Certificate of Correction issued
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| INPADOC Legal Status: |
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