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 Title: |
US6051113:
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing
[ Derwent Title ]
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| Country: |
US United States of America
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| Inventor: |
Moslehi, Mehrdad M.; Los Altos, CA
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| Assignee: |
CVC Products, Inc., Rochester, NY
other patents from CVC PRODUCTS, INC. (695388) (approx. 41)
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| Published / Filed: |
2000-04-18
/ 1998-05-20
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| Application Number: |
US1998000082043
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| IPC Code: |
Advanced:
C23C 14/56;
Core:
more...
IPC-7:
C23C 14/34;
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| ECLA Code: |
C23C14/56F;
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| U.S. Class: |
Current:
204/192.12;
118/719;
118/723.VE;
204/192.11;
204/192.15;
204/192.2;
204/298.03;
204/298.04;
204/298.07;
204/298.08;
204/298.09;
204/298.11;
204/298.12;
204/298.15;
204/298.23;
204/298.25;
204/298.26;
204/298.27;
204/298.28;
204/298.29;
Original:
204/192.12;
204/192.15;
204/192.2;
204/298.03;
204/298.04;
204/298.07;
204/298.08;
204/298.09;
204/298.12;
204/298.11;
204/298.15;
204/298.23;
204/298.25;
204/298.26;
204/298.27;
204/298.28;
204/298.29;
204/192.11;
118/719;
118/723.VE;
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| Field of Search: |
204/192.12,192.2,192.15,298.03,298.04,298.07,298.08,298.09,298.11,298.15,298.23,298.25,298.26,298.27,298.28,298.29,298.12,298.16,192.11
118/719,723 R,723 VE
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| Priority Number: |
| 1998-05-20 |
US1998000082043 |
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| Abstract: |
An apparatus and method for depositing plural layers of materials on a substrate within a single vacuum chamber allows high-throughput deposition of structures such as those for GMR and MRAM application. An indexing mechanism aligns a substrate with each of plural targets according to the sequence of the layers in the structure. Each target deposits material using a static physical-vapor deposition technique. A shutter can be interposed between a target and a substrate to block the deposition process for improved deposition control. The shutter can also preclean a target or the substrate and can also be used for mechanical chopping of the deposition process. In alternative embodiments, plural substrates may be aligned sequentially with plural targets to allow simultaneous deposition of plural structures within the single vacuum chamber. A monitoring and control device can be wed to optimize equipment state, process state, and wafer state parameters by sensing each respective state during or after the deposition process. In another alternative embodiment, an additional indexing mechanism can be associated with one or more targets to move the indexing targets positioned on an indexing target plane into a position aligned with the substrate. The indexing target plane is formed within the vacuum chamber and substantially parallel to a fixed target plane in order to reduce the overall PVD equipment footprint for a given number of PVD targets.
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| Attorney, Agent or Firm: |
Baker Botts L.L.P. ;
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| Primary / Asst. Examiners: |
McDonald, Rodney;
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| INPADOC Legal Status: |
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| Parent Case: |
RELATED APPLICATIONS
This invention claims priority from U.S. patent Application Ser. No. 09/067,143 entitled pending "Apparatus and Method for Multi-Target Physical-Vapor Deposition of a Multi-Layer Material Structure," filed on Apr. 27, 1998, by Moslehi, et al., assigned to CVC, Inc.
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| Designated Country: |
AE AL AM AP AT AZ BA BB BG BR BY CA CH CN CU CZ DK EA EE ES FI GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR DE GB
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| Family: |
Show 6 known family members
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First Claim:
Show all 75 claims |
What is claimed is:
1. An apparatus for physical-vapor deposition of a multi-layer material structure onto a substrate, the material structure having plural material layers deposited according to a predetermined sequence, each layer comprised of one of the plural materials, the apparatus comprising:
- a vacuum chamber;
- plural targets comprising at least one indexing target disposed in the vacuum chamber and at least one fixed target disposed in the vacuum chamber, at least one target comprised of one of the plural materials;
- at least one power source associated with the plural targets for supporting physical-vapor deposition;
- a substrate support disposed in the vacuum chamber for supporting the substrate; and
- a target indexing mechanism for aligning the at least one indexing target with the substrate to support deposition of the multi-layer material structure of the plural materials according to the predetermined sequence.
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| Background / Summary: |
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| Drawing Descriptions: |
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| Description: |
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| Forward References: |
Show 36 U.S. patent(s) that reference this one
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