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 Title: |
JP2005196471A2:
EXTERNAL APPEARANCE INSPECTION DEVICE AND MASK INSPECTION METHOD
[ Derwent Title ]
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Country:
Kind: |
JP Japan
A2 PUBLISHED UNEXAMINED PATENT APPLICATION [FROM 16-07-1971 ONWARDS] OR PUBLISHED UNEXAMINED PATENT APPLICATION (BASED ON INTERNATIONAL APPLICATION) [FROM 26-07-1979 ONWARDS] i
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| Inventor: |
HARABE NOBUYUKI;
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| Assignee: |
NEC CORP
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| Published / Filed: |
2005-07-21
/ 2004-01-07
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| Application Number: |
JP2004000002083
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| IPC Code: |
Advanced:
G01B 11/24;
G01N 21/956;
G03F 1/08;
G06T 1/00;
H01L 21/66;
IPC-7:
G01B 11/24;
G01N 21/956;
G03F 1/08;
G06T 1/00;
H01L 21/66;
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| Priority Number: |
| 2004-01-07 |
JP2004000002083 |
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| Abstract: |
<P>PROBLEM TO BE SOLVED: To provide an external appearance inspection device which can detect the defect of a reticle with high sensitivity. <P>SOLUTION: The external appearance inspection device is provided with; an image input part 1 which optically scans a mask which is an inspection object and outputs input image data 5a; a reference image generation part 2 which generates reference image data 5c from design data 5b relating to the pattern of a reticle; a searching part 3 which searches regions of the same form on the reference image data 5c; and a comparison part 4 which compares and collates regions corresponding to the regions of the same form searched by the searching part 3 on the input image data 5a. <P>COPYRIGHT: (C)2005,JPO&NCIPI
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| Family: |
None
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