Work Files Saved Searches
   My Account                                                  Search:   Quick/Number   Boolean   Advanced   Derwent    Help   


 The Delphion Integrated View

  Buy Now:   Buy PDF- 6pp  PDF  |   File History  |   Other choices   
  Tools:  Citation Link  |  Add to Work File:    
  View:  Expand Details   |  INPADOC   |  Jump to: 
  Go to:  Derwent  
 Email this to a friend  Email this to a friend 
       
Title: US3852771: ELECTRON BEAM RECORDING PROCESS
[ Derwent Title ]


Country: US United States of America

View Images High
Resolution

 Low
 Resolution

 
6 pages

 
Inventor: Ross, Daniel Louis; Princeton, NJ
Barton, Lucian Anthony; Trenton, NJ

Assignee: RCA Corporation, New York, NY
other patents from RCA CORPORATION (466175) (approx. 7,929)
 News, Profiles, Stocks and More about this company

Published / Filed: 1974-12-03 / 1973-02-12

Application Number: US1973000332025

IPC Code: Advanced: G03C 1/705; G03C 1/72; G03F 7/022; G03F 7/038; G03F 7/039; G03F 7/20; G03G 15/05; H01L 21/027; H05K 3/00;
Core: more...
IPC-7: G01D 15/06;

U.S. Class: Current: 430/296; 347/163; 347/226; 430/154; 430/270.1; 430/326; 430/942; 534/561;
Original: 346/074.E; 096/035.1; 096/036; 096/036.2; 096/075; 096/091.D; 096/115.R; 260/141; 346/074.CR;

Field of Search: 096/36.1,35.1,36.2,91 D,36 346/74 CH,74 CR,74 E

Priority Number:
1973-02-12  US1973000332025

Abstract: Recording media comprising a mixture of 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)-benzophenone and an alkali soluble resin are suitable for recording information with electron beams. These recording media have high sensitivity, high resolving power and can be reproducibly formulated.

Attorney, Agent or Firm: Bruestle, G. H. ; Morris, B. E. ;

Primary / Asst. Examiners: Bowers, Jr., Charles L.;

INPADOC Legal Status: None          Buy Now: Family Legal Status Report

Family: Show 16 known family members

First Claim:
Show all 5 claims
    1. In a method of recording information whereby a modulated beam of electrons is scanned across a surface of an electron beam sensitive material which becomes more soluble in a developer solvent when impinged upon by the beam of electrons and the electron beam sensitive material is developed with the developer solvent so as to remove the solubilized portion, the improvement which comprises employing in an electron beam sensitive layers of said material a mixture consisting essentially of from about 1 to about 50% by weight, as based on the total weight of the mixture of an active compound of the structure [Figure]

Background / Summary: Show background / summary

Drawing Descriptions: Show drawing descriptions

Description: Show description

Forward References: Show 9 U.S. patent(s) that reference this one

       
U.S. References: Go to Result Set: All U.S. references   |  Forward references (9)   |   Backward references (6)   |   Citation Link

Buy
PDF
Patent  Pub.Date  Inventor Assignee   Title
Buy PDF- 11pp US3046118  1962-07 Schmidt   Process of making printing plates and light sensitive material suitable for use therein
Buy PDF- 5pp US3387975  1968-06 Tamura   METHOD OF MAKING COLOR SCREEN OF A CATHODE RAY TUBE
Buy PDF- 3pp US3402044  1968-09 Steinhoff et al.   LIGHT-SENSITIVE NAPHTHOQUINONE DIAZIDE COMPOSITION AND MATERIAL CONTAINING AN ALKALI INSOLUBLE POLYMER
Buy PDF- 4pp US3622322  1971-11 Brill  RCA Corporation PHOTOGRAPHIC METHOD FOR PRODUCING A METALLIC PATTERN WITH A METAL RESINATE
Buy PDF- 5pp US3634082  1972-01 Christensen  Shipley Company, Inc. LIGHT-SENSITIVE NAPHTHOQUINONE DIAZIDE COMPOSITION CONTAINING A POLYVINYL ETHER
Buy PDF- 7pp US3661582  1972-05 Broyde  Western Electric Company, Incorporated ADDITIVES TO POSITIVE PHOTORESISTS WHICH INCREASE THE SENSITIVITY THEREOF
       
Foreign References: None

Other Abstract Info: CHEMABS 085(14)102437V CHEMABS 087(05)039176H

Inquire Regarding Licensing

Powered by Verity


Plaques from Patent Awards      Gallery of Obscure PatentsNominate this for the Gallery...

Thomson Reuters Copyright © 1997-2010 Thomson Reuters 
Subscriptions  |  Web Seminars  |  Privacy  |  Terms & Conditions  |  Site Map  |  Contact Us  |  Help