 |
|
|
|
|
|
 Title: |
US4056716:
Defect inspection of objects such as electronic circuits
[ Derwent Title ]
|
| Country: |
US United States of America
|
| |
| Inventor: |
Baxter, Duane Willard; Rochester, MN
Shipway, Richard Edward; Endwell, NY
|
| Assignee: |
International Business Machines Corporation, Armonk, NY
other patents from INTERNATIONAL BUSINESS MACHINES CORPORATION (280070) (approx. 44,393)
News, Profiles, Stocks and More about this company
|
| Published / Filed: |
1977-11-01
/ 1976-06-30
|
| Application Number: |
US1976000701337
|
| IPC Code: |
Advanced:
G01B 11/24;
G01N 21/88;
G01N 21/93;
G01N 21/956;
G01R 31/308;
G06T 1/00;
H05B 39/08;
Core:
G01R 31/28;
H05B 39/00;
more...
IPC-7:
H04N 1/38;
|
| ECLA Code: |
G01N21/956; G01R31/308; H05B39/08R;
|
| U.S. Class: |
Current:
382/148;
348/126;
382/149;
382/217;
Original:
364/515;
178/006;
324/073.PC;
358/106;
|
| Field of Search: |
235/151.31,151.3
178/DIG. 37,6
324/73 PC
073/355
|
| Priority Number: |
| 1976-06-30 |
US1976000701337 |
|
| Abstract: |
Successive areas of a high-resolution object image are compared with corresponding areas of a low-resolution master pattern to produce signals representing the quality of the object. Comparison is effected by detecting which of a set of features occurs in each area of the object image, detecting which feature of the same set occurs in a larger area of the master pattern, and determining whether these two features are the same.
|
| Primary / Asst. Examiners: |
Wise, Edward J.;
|
| INPADOC Legal Status: |
None
Family Legal Status Report
|
| Family: |
Show 9 known family members
|
First Claim:
Show all 8 claims |
Having described a preferred embodiment thereof, I claim as my invention:
1. A method of inspecting an object for defects, comprising the steps of:
- a. producing a high-resolution electronic representation of an object, said representation having a plurality of cells each corresponding to a first amount of area on said object;
- b. storing a low-resolution master pattern having a plurality of cells each representing a second, substantially larger amount of area on said object;
- c. detecting a first of a predetermined set of features in a first window comprising a plurality of said cells of said high-resolution representation;
- d. detecting a second feature of said set in a second window comprising a plurality of said cells of said low-resolution master pattern, said second window representing a substantially larger total area on said object than the area represented by said first window;
- e. comparing said first feature with said second feature; and
- f. repeating steps (c), (d) and (e) for different ones of said windows, representing further areas on said object.
|
| Background / Summary: |
Show background / summary
|
| Drawing Descriptions: |
Show drawing descriptions
|
| Description: |
Show description
|
| Forward References: |
Show 22 U.S. patent(s) that reference this one
|
