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Title: |
US5432352:
Ion beam scan control
[ Derwent Title ]

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Country: |
US United States of America

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Inventor: |
van Bavel, Marcus; Elgin, TX

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Assignee: |
Eaton Corporation, Cleveland, OH
other patents from EATON CORPORATION (161150) (approx. 4,296)
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Published / Filed: |
1995-07-11
/ 1994-02-08

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Application Number: |
US1994000193436

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IPC Code: |
Advanced:
H01J 37/317;
Core:
more...
IPC-7:
H01J 37/20;

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ECLA Code: |
H01J37/317A;

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U.S. Class: |
Current:
250/492.21;
250/440.11;
Original:
250/492.21;
250/440.11;

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Field of Search: |
250/492.2,492.1,492.21,442.11,440.11,492.3

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Priority Number: |
| 1994-02-08 |
US1994000193436 |

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Abstract: |
A scan control for use with an ion implantation system. A servo motor having an output shaft scans a wafer support through an ion beam to controllably treat the wafer. A digital signal processor monitors an encoder output corresponding to motor shaft orientation and compares this position with a desired position of the wafer support. An error signal modifies a motor energization signal based on this comparison. Velocity damping based upon sensed motor speed and wafer support speed smooths the scan motion via a second motor energization correction.

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Attorney, Agent or Firm: |
Watts, Hoffmann, Fisher & Heinke ;

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Primary / Asst. Examiners: |
Berman, Jack I.; Beyer, James

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INPADOC Legal Status: |
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